Engineering Thin Films and Nanostructures with Ion Beams
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Описание:
Ion-beam techniques have been used to produce thin film for the semiconductor industry for decades, but because of cost considerations, they have not been widely used for other applications such as metal surface treatment. New and smaller manufacturing devices now available have made it possible to use the ion-beam for even more industrial applications, many of which require custom tailoring of materials. Knystautas (nanotechnology, CIVEN, Venice, Italy) and over 20 other contributors present papers that both review previous work done on ion-beam modification of materials, and include new work on innovative applications. Chapters address ion-beam effects in magnetic thin films, optical effects of ion implantation, nanostructured transition- metals nitride layers, and forensic applications of ion-beam mixing & surface spectroscopy of latent fingerprints. The book includes a glossary and CD-ROM with video clips from an electron microscope.Похожие книги
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